PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES

**Definition:** This place covers:

Photolithographic materials, processing these materials for producing textured or patterned surfaces, and apparatus for processing these materials.

**Limiting references (this place does not cover):** - Phototypographic composing devices -> B41B - Apparatus or arrangements for taking, projecting or viewing photographs -> G03B - Photosensitive materials or processes for photographic purposes -> G03C - Electrophotography, sensitive layers or processes thereof -> G03G - Holographic processes and apparatus -> G03H - Reproduction of pictures or patterns by scanning and converting into electrical signals -> H04N

**Glossary:** - Photosensitive: Sensitive to electromagnetic radiation but also to corpuscular radiation - Photosensitive compositions: Photosensitive substances, e.g. quinonediazides, and, if applicable, binders or additives - Photosensitive materials: Photosensitive compositions, e.g. photoresists, the bases carrying them and, if applicable, auxiliary layers